Technological capabilities and services

• About NRI Electron
  • News
  • History
  • Main activities
  • Quality management system
  • Organizational Structure
  • Scientific and production communications
  • Achievements
• Products
  • 1.FPU
    • 1.1.FPU-4A, FPU-4P SOLAR-BLIND PHOTODETECTORS
    • 1.2. FPU – 1M PHOTODETECTOR
    • 1.3. FPU – 2M PHOTODETECTOR
    • 1.4. UNIFIED LOW LIGHT LEVEL PHOTODETECTOR MODULES
  • 2.SOLID STATE
    •          2.1. CCDs
      (Charge-Coupled Devices)
      • 2.1.1. ARRAY CCD 33М
      • 2.1.2.CCD 26М
      • 2.1.3.CCD 28М
      • 2.1.4.CCD "Quadro-T"
      • 2.1.5.CCD "Quadro"
    •          2.2. LINEAR CCD's
      (Charge-Coupled Devices)
      • 2.2.1.Linear CCD 6L
      • 2.2.2.Linear CCD 8L
      • 2.2.3.Linear CCD 29L
      • 2.2.4.Linear CCD 30L
      • 2.2.5.Linear CCD 32L
      • 2.2.6.LINEAR CCD up to 12000 PIXELS
  • 3.VACUUM
    • 3.1.PHOTO X-RAY TUBE
    • 3.2. VIDICONS
    • 3.3. SILICON VIDICONS
    • 3.4.PMT
      (Photomultiplier tubes)
      • 3.4.1. PMT-143-1
      • 3.4.2.PMT-175
      • 3.4.3. PMT-176
      • 3.4.4. PMT-183,183-1
      • 3.4.5. PMT-186
      • 3.4.6. PMT-187
      • 3.4.7. PMT-188
      • 3.4.8. PMT-tetrode
  • 4. HIGH-SENSITIVE TV DEVICES
    • 4.1. PORTABLE LOW LIGHT LEVEL HYBRID TV DEVICE BASED ON ELECTRON-SENSITIVE CCD
    • 4.2. FMTP1-1
    • 4.3. FMTP1-2
    • 4.4. FMTP 3
  • Advanced development
  • Technological capabilities and services
• Contacts

JSC NRI "Electron" has successful experience in the development and manufacture of electronic tubes, solid-state photosensitive devices and based-on modules.
NRI "Electron" also provides the following services:

• Production of fine metal meshes by an electroplating and photolithography method with a pitch from 10 to 3 um and thickness from 3 um and more;
• Production of flat wafers of any type of glass with flatness not worse than 3-5 fringes (e.g. for vacuum and solid state device input windows);
• Production of vacuum device glass envelopes components (cylinders, stems, bulbs);
• Design and manufacture of special fixtures, gauges, dies and moulds with use of metal working equipment;

For development and production of modern electronic devices the enterprise has available the following advanced technologies:

• Basic bipolar planar technique for production of structures based on monocrystal silicon (projection photolithography, layer plasma etching, ion doping, gaseous phase;
• Basic technique of monolayer structures production by a method of one layer at a time deposition in vacuum (e.g. for photosensitive devices);
• Technique of device manufacture on manipulator type automatic equipment, permitting to fulfil a sequence of technology operations in 10^-10 mm Hg vacuum without withdrawel the product from an operation chamber of the equipment (technology of transfer in vacuum);
• Gaseous epitaxy technology with use of metallo-organics (MOCVD epitaxy) for forming of A₃B₅ structures;
• Magnetron and electron-beam plasma deposition technology of metal, semiconductor and dielectric thin layers of wide material range on various kind substrates;
• Different material connectoin technology by the method of welding (laser, microplasma, high-frequency, electrocontact) for manufacture of device units and assemblies;
• Technology of fire, high-frequency and laser welding-up of glass units, used for manufacture of vacuum device envelopes;
• Technology of parts and units electro-erosion treatment, used for forming of electrode configuration on vacuum device glass bulbs.

JSC “NRI Electron” invites your enterprise to mutual collaboration.